PVD deposition machine / ion beam-assisted / thin-film

Veeco's SPECTOR? Large Area Planetary Ion Beam Deposition System combines unsurpassed ion beam film quality with batch sizes near that of e-beam systems. In addition to a larger overall coating area, the robust fixture supports processing monolithic substrates up to 400mm in diameter and 100mm thick. Veeco has included our 16cm RF high-power deposition source and ultra-low contamination RF neutralizers to ensure high deposition rates and film quality. For maximum stoichiometry control and in-situ substrate pre-cleaning or etch support, the system is also equipped with our 12cm RF assist ion source.

Ion beam quality with industry-leading throughput provides the lowest cost of ownership
Exceptional material uniformity across 400mm planets ensures maximum product yield
High current RF ion sources provide excellent deposition rates
Maximum product flexibility provided by large substrate and palette support