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PECVD Deposition Machine / PVD

PECVD deposition machine / PVD

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Vnation JSC

PECVD deposition machine / PVD
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  • Method:

    PECVD, PVD

Most important Features:

Combined PVD & PECVD process - to deposit very smooth coatings

Special Si containing gas line - controlled by additional Mass Flow Controller

Silicon increases heat resistance
Silicon decreases internal stress of the coating
Silicon improves adhesion -> thick DLC coatings are possible
BIAS supply 350 kHz - to enable deposition of non-conductive layers.

Special heaters with dust filter

grids in front of the heaters
to avoid contamination of the substrates by dust released from the heaters
VIRTUAL SHUTTER? to clean the target to the back before deposition.

Mechanical TUBE SHUTTERS? to protect targets

against contamination by acetylene
against being coated when idle

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