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EMCP Plasma Engraving System / Process / For Non-volatile Materials

EMCP plasma engraving system / process / for non-volatile materials

E-6000 Series

Vnation JSC

EMCP plasma engraving system / process / for non-volatile materials
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  • Technique:

    EMCP plasma

  • Applications:

    process, for non-volatile materials

In order to achieve rapid increases of aerial densities of HDD, advanced patterning solutions are required for thin film head production. Because of this, the leading-edge semiconductor processes are regarded as a breakthrough of the HDD industry.

This EMCP etch system is able to provide superior performance when it comes to profile control, along with superior etching rates and greater selectivity, when compared to ion-milling processes of traditional type.

Để lại bình luận

Go to the Hitachi High-Technologies Europe website for more information
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