PVD deposition machine / sputtering / thin-film / vacuum
CT100
Vnation JSC

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Method:
PVD
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Technology:
sputtering
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Deposition type:
thin-film
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Other characteristics:
vacuum
The philosophy of this brand-new development is to offer a high quality multi-chamber sputtering system at an afforbale cost so that it can fit any tight budget.
This equipment has two modules based on either one of our best-sellers, the DP560or the AC450, isolated from each other by a load lock, in order to get close to zero particulate contamination.
Central load lock introduction used also for transfer CT100: vacuum chamber with manual transfer (Alliance Concept) {JPEG}
Manual vacuum transfer with high precision
Planar deposition chamber
Convergent-deposition chamber
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This brand-new CT100 clustertool is the manual two-chamber version of our CT200, automated clustertool, that can host up to 6 chambers.